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IEUVI Objectives

  • To coordinate collaboration among world EUVL (Extreme Ultraviolet Lithography) consortia

    • Align R&D activities to the International Technology Roadmap for Semiconductors (ITRS)
    • Coordinate R&D collaboration activities among consortia
    • Manage knowledge of EUVL IP

  • To encourage coordination among suppliers

    • Share progress reports

  • To identify implementation issues

    • Identify potential "show stoppers" for EUVL implementation
    • Communicate implementation issues (e.g., to consortia, IC manufacturers, suppliers, and governments)
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