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IEUVI

Special Topic & Panel Discussion


September 10, 2017

1 Agenda by Paolo Gargini, Standford University

2 Roadmap evolution: From NTRS to ITRS, from ITRS 2.0 to IRDS by Paolo Gargini, Standford University

3 Lithography status and IMEC view on 3D-enabled scaling by Greg McIntyre, IMEC

4 3D scaling through deposition and etch by Uday Mitra, Applied Materials

5 Nanodevices for monolithic 3D: The 'DREAMERS' by Jeffrey Bokor, UC Berkeley

6 High lithographic resolution & 3D: the 3D memory is the important part by Erik P. DeBenedictis, Sandia National Laboratories