IEUVI Objectives

• To coordinate collaboration among world EUVL (Extreme Ultraviolet Lithography) consortia
  
  
  • Align R&D activities to the International Technology Roadmap for Semiconductors (ITRS)
  • Coordinate R&D collaboration activities among consortia
  • Manage knowledge of EUVL IP
  
  
• To encourage coordination among suppliers
  
  
  • Share progress reports
    
    
• To identify implementation issues
  
  
  • Identify potential "show stoppers" for EUVL implementation
  • Communicate implementation issues (e.g., to consortia, IC manufacturers, suppliers, and governments)